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Chemical deodorization equipment

Chemical washing deodorization equipment deodorization technology also known as acid-base purification technology is the deodorization of odorous gas by washing tower with acid and alkali. Generally water washing can only remove soluble or partially slightly soluble odor substances such as ammonia; acid washing can remove alkaline odor substances such as ammonia and amines; alkali washing is suitable for removing acid odor substances such as hydrogen sulfide and low-grade fatty acids.

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Deodorization process principle of chemical deodorization equipment

Chemical washing deodorization equipment deodorization technology, also known as acid-base purification technology, is the deodorization of odorous gas by washing tower with acid and alkali. Generally, water washing can only remove soluble or partially slightly soluble odor substances, such as ammonia; acid washing can remove alkaline odor substances such as ammonia and amines; alkali washing is suitable for removing acid odor substances such as hydrogen sulfide and low-grade fatty acids. Therefore, in order to completely remove all kinds of odor substances in the waste gas, the multi-stage chemical washing method of acid washing and alkali washing in series can be used.

Basic principle of chemical washing deodorization equipment deodorization method:

In order to achieve deodorization, the irreversible chemical reaction between the odor components and the main components of chemical solution is used to generate new odorless substances. Details are as follows:

H2S+2NaOH+4NaCLO Na2SO4+4NaCL+2H2O

H2S+ NaCLO NaCL+H2O+S

2NH3+ H2SO4 (NH4)2SO4

污染物去除效率表(僅供參考)

污染物	污染物形式	初始濃度	吸收中和液	去除效率
氯化氫HCL	Gas	≤500mg/m3	NaOH溶液	95～99%
氮氧化物NOx	Gas	≤1000mg/m3	NaOH溶液或特殊藥品	60～75%
硫酸H2SO4	Gas	≤500mg/m3	NaOH溶液	90～98%
硫化氫H2S	Gas	≤500mg/m3	NaOH溶液	90～99%
溴Br2	Gas	≤500mg/m3	NaOH溶液	90～99%
二氧化碳CO2	Gas	≤500mg/m3	NaOH溶液	65～85%
氯CL2	Gas	≤500mg/m3	NaOH溶液	90～99%
甲醛HCHO	Gas或Liquid(3microns以上)	≤1000mg/m3	NaOH溶液	90～99%
硫醇RSH	Gas或Liquid(3microns以上)	≤1000mg/m3	特殊藥品為酸霧溶液	90～99%
二氧化氯CLO2	Gas	≤1000mg/m3	特殊藥品為酸霧溶液	90～99%
醋酸CH3COOH	Gas或Liquid(3microns以上)	≤1000mg/m3		95～99%
丙酮CH3COCH3	Gas	≤1000mg/m3		95～99%
氫氧化鈉NaOH	Liquid(3microns以上)	≤1000mg/m3	H2SO4溶液	98～99%
乙醇CH3CH2OH	Gas或Liquid(3microns以上)	≤1000mg/m3		95～99%
甲酸HCOOH	Gas	≤1000mg/m3		90～99%
氫溴酸HBr	Gas或Liquid(3microns以上	≤1000mg/m3		90～99%
氫氟酸HF	Gas	≤1000mg/m3	NaOH溶液	95～98%
氰酸HCN	Gas	≤1000mg/m3		65～99%
氨氣NH3	Gas	≤1000mg/m3	H2SO4溶液	95～99%

H2S+2NaOH+4NaCLO Na2SO4+4NaCL+2H2O

H2S+ NaCLO NaCL+H2O+S

2NH3+ H2SO4 (NH4)2SO4

污染物去除效率表(僅供參考)

污染物	污染物形式	初始濃度	吸收中和液	去除效率
氯化氫HCL	Gas	≤500mg/m3	NaOH溶液	95～99%
氮氧化物NOx	Gas	≤1000mg/m3	NaOH溶液或特殊藥品	60～75%
硫酸H2SO4	Gas	≤500mg/m3	NaOH溶液	90～98%
硫化氫H2S	Gas	≤500mg/m3	NaOH溶液	90～99%
溴Br2	Gas	≤500mg/m3	NaOH溶液	90～99%
二氧化碳CO2	Gas	≤500mg/m3	NaOH溶液	65～85%
氯CL2	Gas	≤500mg/m3	NaOH溶液	90～99%
甲醛HCHO	Gas或Liquid(3microns以上)	≤1000mg/m3	NaOH溶液	90～99%
硫醇RSH	Gas或Liquid(3microns以上)	≤1000mg/m3	特殊藥品為酸霧溶液	90～99%
二氧化氯CLO2	Gas	≤1000mg/m3	特殊藥品為酸霧溶液	90～99%
醋酸CH3COOH	Gas或Liquid(3microns以上)	≤1000mg/m3		95～99%
丙酮CH3COCH3	Gas	≤1000mg/m3		95～99%
氫氧化鈉NaOH	Liquid(3microns以上)	≤1000mg/m3	H2SO4溶液	98～99%
乙醇CH3CH2OH	Gas或Liquid(3microns以上)	≤1000mg/m3		95～99%
甲酸HCOOH	Gas	≤1000mg/m3		90～99%
氫溴酸HBr	Gas或Liquid(3microns以上	≤1000mg/m3		90～99%
氫氟酸HF	Gas	≤1000mg/m3	NaOH溶液	95～98%
氰酸HCN	Gas	≤1000mg/m3		65～99%
氨氣NH3	Gas	≤1000mg/m3	H2SO4溶液	95～99%

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